October 1, 2026
AlixLabs embarks on a six-month evaluation of its Atomic Layer Etch Pitch Splitting (APS™) technology within the NanoIC pilot line, coordinated by imec.
August 6, 2026
New capacity supports continued commercialization of APS™ technology and expanded beta testing for semiconductor customers. LUND, Sweden — August 6, 2026 — AlixLabs AB, a Swedish […]
June 24, 2026
Atomic Layer Etching (ALE) Pattern Shaping is a precision etching technique that selectively removes unwanted material from the surface of semiconductor structures.
June 24, 2026
Atomic Layer Etching (ALE) Surface Smoothening is an advanced etching technique developed by AlixLabs to enhance the surface quality of semiconductor materials, particularly GaN (Gallium Nitride) and SiC (Silicon Carbide).